论文标题
阴影和强烈的重力镜头在同质等离子体中通过范德华黑洞
Shadows and Strong Gravitational Lensing by Van der Waals Black Hole in Homogeneous Plasma
论文作者
论文摘要
在本文中，我们首先分析了范德华（VDW）黑洞的地平线结构，然后在没有等离子体介质以及存在同质等离子体介质的情况下研究其阴影。我们发现，范德华参数$ a $ a $ a $ a和$ b $都对黑洞的阴影都有重大影响。我们还观察到，同质等离子体介质中阴影的半径降低，而参数$σ= \ frac {ω_p} {ω_ {\ infty}} $（等离子体频率和光子频率的比率）增加了阴影含量含量质量介质的阴影和半径。我们还讨论了同质等离子体介质中的强重力镜头。我们观察到，强场中的光子球半径，挠度极限系数和偏转角受到同质等离子体培养基的存在。我们还发现，具有均匀等离子体的范德华黑洞在强场上的挠度限制大于真空介质的挠度。此外，我们通过以强场限制中的超级质量黑洞的示例，并伴有同质等离子体的效果来讨论可观察到的角位置$θ_ {\ infty} $，分隔$ s $和放大$ r_ {mag {mag {mag} $。可以得出结论，范德华参数$ a $，$ b $和均质等离子体介质对阴影和强烈重力镜片都有重大影响。
In this paper, we first analyze the horizon structure of the Van der Waals(VdW) black hole and then investigate its shadow in the absence of a plasma medium as well as the presence of a homogeneous plasma medium. We find that both the Van der Waals parameters $a$ and $b$ have a significant effect on the shadow of the black hole. We also observe that the radius of the shadow in a homogeneous plasma medium decreases while parameter $σ=\frac{ω_p}{ω_{\infty}}$ ( the ratio of plasma frequency and photon frequency) increases and the radius of the shadow inhomogeneous plasma medium is larger than the vacuum medium. We also discuss the strong gravitational lensing in a homogeneous plasma medium. We observe that the photon sphere radius, deflection limit coefficients and deflection angle in the strong field are highly affected by the presence of a homogeneous plasma medium. We also find that the deflection angle in the strong field limit by the Van der Waals black hole with the homogeneous plasma is greater than that of the Vacuum medium. Further, we discuss the observables quantities angular position $θ_{\infty}$, separation $S$ and magnification $r_{mag}$ by taking the example of a supermassive black hole in the strong field limit with the effects of homogeneous plasma. It is concluded that the Van der Waals parameters $a$, $b$ and homogeneous plasma medium have a significant effect on both the shadows and strong gravitational lensing.
