论文标题
在叶子上生长的实例面具
Growing Instance Mask on Leaf
论文作者
论文摘要
基于轮廓的实例分割方法包括一阶段和多阶段方案。这些方法取得了显着的性能。但是,他们必须定义很多要点来分割精确的面具,从而导致高复杂性。我们遵循此问题,并提出了一种称为\ textbf {veinmask}的单发方法,以实现低设计复杂性的竞争性能。具体而言,我们观察到叶子通过主要静脉定位粗缘,并生长较小的静脉以完善扭曲的部分,这使得可以准确覆盖任何物体。同时,主要静脉和小静脉共享相同的增长模式,从而避免对它们进行建模并确保模型简单。考虑到上面的优势,我们建议静脉延迟将实例分割问题作为静脉生长过程的模拟,并预测极性坐标中的主要和小静脉。 此外,引入了质心,例如分割任务,以帮助抑制低质量的实例。此外,周围环境互相关敏感(SCC)模块旨在通过利用每个像素的周围环境来增强特征表达。此外,制定了残留的IOU(R-IOU)损失,以有效地监督主要静脉和小静脉的回归任务。实验表明,在低设计复杂性中,静脉屏蔽的性能要比其他基于轮廓的方法好得多。特别是,我们的方法在可可数据集上的现有基于轮廓的方法优于设计复杂性的一半。
Contour-based instance segmentation methods include one-stage and multi-stage schemes. These approaches achieve remarkable performance. However, they have to define plenty of points to segment precise masks, which leads to high complexity. We follow this issue and present a single-shot method, called \textbf{VeinMask}, for achieving competitive performance in low design complexity. Concretely, we observe that the leaf locates coarse margins via major veins and grows minor veins to refine twisty parts, which makes it possible to cover any objects accurately. Meanwhile, major and minor veins share the same growth mode, which avoids modeling them separately and ensures model simplicity. Considering the superiorities above, we propose VeinMask to formulate the instance segmentation problem as the simulation of the vein growth process and to predict the major and minor veins in polar coordinates. Besides, centroidness is introduced for instance segmentation tasks to help suppress low-quality instances. Furthermore, a surroundings cross-correlation sensitive (SCCS) module is designed to enhance the feature expression by utilizing the surroundings of each pixel. Additionally, a Residual IoU (R-IoU) loss is formulated to supervise the regression tasks of major and minor veins effectively. Experiments demonstrate that VeinMask performs much better than other contour-based methods in low design complexity. Particularly, our method outperforms existing one-stage contour-based methods on the COCO dataset with almost half the design complexity.