论文标题
凝胶掺杂对分子束外延生长的拓扑绝缘体BI2SE3的结构和运输特性的影响
Effect of gallium doping on structural and transport properties of the topological insulator Bi2Se3 grown by molecular beam epitaxy
论文作者
论文摘要
拓扑绝缘子具有非导电的体积和当前的表面状态,因此它们是沿其边界的导电性的。士曲线硒化($ bi_2se_3 $)是最有前途的拓扑绝缘子之一。但是,一个主要的缺点是其自然兴奋剂引起的N型性质,这使批量运输占主导地位。可以通过将化学电位转移到带隙中来克服这种效果,从而使表面状态的传输比散装对应物更为明显。在这项工作中,$ _2se_3 $是由分子束外延生长的,并以0.8、2、7和14的掺杂。 GA的%,目的是将化学势转移到带隙中。研究了GA掺杂$ bi_2se_3 $的结构,形态和电子特性。拉曼和X射线衍射测量结果证实了将掺杂剂掺入晶体结构中。温度范围为1.5至300 K的传输和磁度测量值表明,GA掺杂的$ bi_2se_3 $是N型,其批量电荷载体浓度为$ 10^{19} cm^{ - 3} $。值得注意的是,弱抗钙化效应(WAL)测量的磁转移证实了表面状态的存在,掺杂百分比为2 at。 GA和相干长度值的百分比在50-800 nm之间,这构成了该材料中拓扑超导的可能性。
Topological insulators possess a non-conductive bulk and present surface states, henceforth, they are electrically conductive along their boundaries. Bismuth selenide ($Bi_2Se_3$) is one of the most promising topological insulators. However, a major drawback is its n-type nature arising from its natural doping, which makes the transport in the bulk dominant. This effect can be overcome by shifting the chemical potential into the bandgap, turning the transport of the surface states to be more pronounced than the bulk counterpart. In this work, $Bi_2Se_3$ was grown by molecular beam epitaxy and doped with 0.8, 2, 7, and 14 at. % of Ga, with the aim of shifting the chemical potential into the bandgap. The structural, morphological, and electronic properties of the Ga doped $Bi_2Se_3$ are studied. Raman and X-ray diffraction measurements confirmed the incorporation of the dopants into the crystal structure. Transport and magnetoresistance measurements in the temperature range of 1.5 to 300 K show that Ga-doped $Bi_2Se_3$ is n-type with a bulk charge carrier concentration of $10^{19} cm^{-3}$. Remarkably, magnetotransport of the weak antilocalization effect (WAL) measurements confirm the existence of surface states up to a doping percentage of 2 at. % of Ga and coherence length values between 50-800 nm, which envisages the possibility of topological superconductivity in this material.