论文标题

探测FESI,一种具有磁场,压力和微波的D-电子拓扑昆多绝缘子候选者

Probing FeSi, a d-electron topological Kondo insulator candidate, with magnetic field, pressure, and microwaves

论文作者

Breindel, Alexander, Deng, Yuhang, Moir, Camilla M., Fang, Yuankan, Ran, Sheng, Lou, Hongbo, Li, Shubin, Zeng, Qiaoshi, Shu, Lei, Wolowiec, Christian T., Schuller, Ivan K., Rosa, Priscila F. S., Fisk, Zachary, Singleton, John, Maple, M. Brian

论文摘要

最近,报告了相关的D-电子小间隙半导体FESI的表面状态以下的表面状态的证据。在本文报道的工作中,通过电阻率测量值探测了导电表面状态和FESI的大相位,这是温度t,磁场B至60 t和压力P至7.6 GPA的函数,并通过磁场调制微波光谱(MFMMS)技术。还将FESI的性质与近托绝缘子SMB6的性质进行了比较,以解决FESI是否是F-电子杂种绝缘子的D-电子类似物,此外,还有拓扑性掩体绝缘体。 FESI的磁倍率MR在高于和低于发作温度(T_S)19 K的温度下的总体行为与SMB6的总体行为相似。从半导体方案中的电阻率数据推断出的两个能隙随压力增加到约7 GPA而增加,然后滴下液滴,与T_S的急剧抑制相吻合。这种行为与SMB6报告的行为相似,只是在T_S处突然下降之前,SMB6中的两个能隙会降低。 MFMMS测量值在FESI的T_S(19 K)处显示出鲜明的特征,但是对于SMB6,在T_S 4.5 K时未观察到此类特征。 SMB6缺乏T_S的功能可能是由于实验性问题引起的,并且将成为未来研究的主题。

Recently, evidence for a conducting surface state below 19 K was reported for the correlated d-electron small gap semiconductor FeSi. In the work reported herein, the conducting surface state and the bulk phase of FeSi were probed via electrical resistivity measurements as a function of temperature T, magnetic field B to 60 T and pressure P to 7.6 GPa, and by means of a magnetic field modulated microwave spectroscopy (MFMMS) technique. The properties of FeSi were also compared to those of the Kondo insulator SmB6 to address the question of whether FeSi is a d-electron analogue of an f-electron Kondo insulator and, in addition, a topological Kondo insulator. The overall behavior of the magnetoresistance MR of FeSi at temperatures above and below the onset temperature (T_S) 19 K of the conducting surface state is similar to that of SmB6. The two energy gaps, inferred from the resistivity data in the semiconducting regime, increase with pressure up to about 7 GPa, followed by a drop which coincides with a sharp suppression of T_S. This behavior is similar to that reported for SmB6, except that the two energy gaps in SmB6 decrease with pressure before dropping abruptly at T_S. The MFMMS measurements showed a sharp feature at T_S (19 K) for FeSi, but no such feature was observed at T_S 4.5 K for SmB6. The absence of a feature at T_S for SmB6 may be due to experimental issues and will be the subject of a future investigation.

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