论文标题
软X射线辐照引起的分层tincl的金属化
Soft x-ray irradiation induced metallization of layered TiNCl
论文作者
论文摘要
我们进行了软X射线光谱，以研究层状金属氮化金属氯化物TINCL的价带结构和化学状态的光照射时间依赖性。在软X射线照射下，在费米水平（EF）附近的状态强度和Ti3+成分增加，而Cl 2P强度则降低。 Ti 2p-3d共振光谱光谱证实了具有Ti 3D特征的独特的费米边缘。这些结果表明，光诱导的金属化源自CL解吸引起的去解剖学，因此提供了一种控制Tincl的导电性能的新载体掺杂方法。
We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (EF) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p-3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.
