论文标题
X射线纳米光束衍射实验期间单个半导体纳米线的光束损伤
Beam damage of single semiconductor nanowires during X-ray nano beam diffraction experiments
论文作者
论文摘要
使用聚焦同步子辐射的纳米探针X射线衍射(NXRD)是研究单个半导体纳米线的结构特性的强大技术。但是,在环境条件下执行实验时,所需的高X射线剂量和延长的暴露时间会导致辐射损伤。为了揭示辐射损伤的起源,我们比较了在环境条件下以及在第三代源源Petra III的P08光束线的微量焦点站的大气下,在其在环境条件下以及在大气下进行的NXRD实验。 Using an incident X-ray beam energy of 9 keV and photon flux of 10$^{10}$s$^{-1}$, the axial lattice parameter and tilt of individual GaAs/In$_{0.2}$Ga$_{0.8}$As/GaAs core-shell nanowires were monitored by continuously recording reciprocal space maps of the 111 Bragg reflection at a fixed空间位置在几个小时内。此外,通过阴极发光光谱,能量分散性X射线光谱和扫描电子显微镜,分别在NXRD曝光之前和之后,研究了(in Ga)作为量子良好的量子良好,暴露纳米线和纳米线形态的原子组成。在环境条件下暴露的纳米线显示出严重的光学和形态损害,这对在大气下暴露的纳米线减少了。观察到的损伤主要归因于X射线诱导的空气中的臭氧反应的氧化过程。由于与GAAS相比,由于传热系数较低,因此该氧化物壳通过纳米侧侧面限制了热传递,这被认为是纳米线的主要散热通道。
Nanoprobe X-ray diffraction (nXRD) using focused synchrotron radiation is a powerful technique to study the structural properties of individual semiconductor nanowires. However, when performing the experiment under ambient conditions, the required high X-ray dose and prolonged exposure times can lead to radiation damage. To unveil the origin of radiation damage, we compare nXRD experiments carried out on individual semiconductor nanowires in their as grown geometry both under ambient conditions and under He atmosphere at the microfocus station of the P08 beamline at the 3rd generation source PETRA III. Using an incident X-ray beam energy of 9 keV and photon flux of 10$^{10}$s$^{-1}$, the axial lattice parameter and tilt of individual GaAs/In$_{0.2}$Ga$_{0.8}$As/GaAs core-shell nanowires were monitored by continuously recording reciprocal space maps of the 111 Bragg reflection at a fixed spatial position over several hours. In addition, the emission properties of the (In,Ga)As quantum well, the atomic composition of the exposed nanowires and the nanowire morphology are studied by cathodoluminescence spectroscopy, energy dispersive X-ray spectroscopy and scanning electron microscopy, respectively, both prior to and after nXRD exposure. Nanowires exposed under ambient conditions show severe optical and morphological damage, which was reduced for nanowires exposed under He atmosphere. The observed damage can be largely attributed to an oxidation process from X-ray induced ozone reactions in air. Due to the lower heat transfer coefficient compared to GaAs, this oxide shell limits the heat transfer through the nanowire side facets, which is considered as the main channel of heat dissipation for nanowires in the as-grown geometry.