论文标题
量子应用的12英寸玻璃晶片上的功能表面离子陷阱
Functional surface ion traps on a 12-inch glass wafer for quantum applications
论文作者
论文摘要
我们报告了具有标准CMOS兼容后端过程的12英寸玻璃基板上的完美功能射频（RF）表面离子陷阱的大规模制造。已建立的带有AU饰面的电镀铜的铸造铸造后端工艺可直接在玻璃晶片基板上制造表面电极。我们通过用激光冷却的88 SR +离子加载陷阱来测试陷阱。该陷阱显示稳定的操作，在33 MHz频率下，RF振幅在100-230 V范围内。在5 x 10-11 MBAR的真空室中的压力为30分钟的离子寿命为30分钟，这在CMOS兼容且具有成本效益的平台上具有标准铸造过程，这表明了将来实施量子计算系统的令人兴奋的潜力。
We report large-scale fabrication of perfectly functional radio frequency (RF) surface ion traps on a 12-inch glass substrate with a standard CMOS-compatible backend process. Established 12-inch foundry backend process of electroplated Cu with Au finish are employed to fabricate the surface electrodes directly on the glass wafer substrate. We tested a trap by loading it with laser-cooled 88 Sr + ions. The trap shows a stable operation with RF amplitude in the range 100-230 V at 33 MHz frequency. The ion lifetime is on the order of 30 minutes for a pressure in the vacuum chamber of 5 x 10-11 mbar, which demonstrates an exciting potential for future implementation of quantum computing system with a standard foundry process on CMOS compatible and cost-effective platform.
